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Experimental sputtering equipment - メーカー・企業と製品の一覧

Experimental sputtering equipmentの製品一覧

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Simple experimental sputtering device

Two models: manual batch type and simple load lock type. The simple load lock type enables the mass production process of compound semiconductors. Currently accommodating sample tests and equipment tours.

This product is a simple and cost-effective sputtering device that covers everything from basic research to advanced process development. We offer two models: a fully manual, low-cost batch type and a simplified load lock type equipped with a manual transport mechanism. Both models achieve significant cost reductions while maintaining the process performance of higher-end models. We provide consistent and careful support from sample testing and specification compliance to post-delivery follow-up. 【Features】 ■ Reasonable cost and high process performance ■ High reliability capable of handling small-scale production ■ A wide range of options and flexible hardware support backed by extensive track records ■ Supports process development in advanced thin film development with load lock mechanisms and pre-deposition testing ■ A demo unit is permanently available for sample testing *For more details, please refer to the PDF document or feel free to contact us.

  • Sputtering Equipment
  • Plasma surface treatment equipment

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Simple experimental sputtering device (SRV3100 type)

Compact-type sputtering device exclusively for small substrate, achieving low cost with fully manual operation. Standard type for research and experiments.

Commonization of high-reliability upper models with vacuum chambers and exhaust systems. Cost reduction achieved through manual operation methods. Various components (cathodes, substrate holders, etc.) can be selected according to the type of film and purpose. The efficiency and quality of research and development work can be improved with the well-established mechanisms and stable film deposition performance.

  • Other physicochemical equipment
  • Sputtering Equipment

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Experimental sputtering device

Equipped with a simple yet φ3-inch target magnetron cathode and a wide-range turbo molecular pump with a capacity of 200 L/s.

● Price: 5 million yen (including tax) ● φ3 inch target, 1 molybdenum cathode ● RF 300W power supply, with automatic matching box ● Gas system: 1 system (up to 3 systems available as an option), adjustable via mass flow controller ● Capable of sputtering insulators such as oxides. ● Option to install a substrate heater available. ● Simple structure that is easy to use while eliminating unnecessary components. ● Space-saving dimensions: 800W × 600L × 900H.

  • 企業:ヤシマ
  • 価格:1 million yen-5 million yen
  • Plasma surface treatment equipment
  • Organic EL
  • Sputtering Equipment

ブックマークに追加いたしました

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ブックマークを削除いたしました

ブックマーク一覧

これ以上ブックマークできません

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